Electromagnetic Properties of Materials

Project Goals

High-frequency evanescent microwave probe.

This project develops, improves, and analyzes measurement methods, uncertainties, and theory for the characterization of the complex permittivity and permeability of naturally occurring and artificial materials in the radio-frequency, microwave, and millimeter-wave spectrum as a function of temperature and bias fields. Emphasis is on metrology, thin films, liquids, biological materials, high frequencies, small scales, and artificial materials.

Customer Needs

Current research is in the areas of high frequencies, variable temperatures, and nanoscale dimensions. Currently, thin films, frequencies, variable temperatures, and nanoscale dimensions. Currently, thin films, artificial and biological materials, substrates, and liquids are perceived as the most important measurement areas. Substrate-based components employing thin films form the basis for microelectronic circuitry. Electronic substrate materials are used in printed wiring boards (PWB), low-temperature cofired ceramics (LTCC), CPU chips, and microwave components. Industry requires new measurement methods with well-characterized uncertainties, at microwave and millimeter frequencies and over variable temperatures. Data on temperature-dependent dielectric and loss properties of ceramics, substrates, and crystals at microwave and millimeter frequencies is crucial in the wireless and time-standards arena. For example, computer-based design methods require very accurate data on the dielectric and magnetic properties of these materials over wide ranges of frequency and temperature. An understanding of loss mechanisms in low-loss crystals is important when interpreting measurement results. Artificial dielectrics are becoming commonplace and can be designed to obtain properties not exhibited in nature. New dielectric metrology is needed for these areas.

Various applications require composite dielectrics that emulate the human body's electrical properties for testing metal detectors and analyzing electromagnetic interference (EMI) to implanted medical devices. Measurements of liquid permittivity are needed to support biotechnology research. To support the evolving microelectronics industry, methods for characterizing nanoscale and metamaterial properties will be necessary for the development of novel new technologies. On-chip microscale-to-nanoscale measurements of permittivity are important for the microelectronics industry. Both solid and liquid dielectric reference materials are needed to provide measurement traceability to NIST. Measurement intercomparisons provide assessments of the quality of material characterization.

Newly developed thin-film materials such as hightemperature superconductors, ferroelectrics, and magnetoelectrics hold great potential for improved functionality in microwave devices, but are still in the critical stage of material development. Accurate characterization of the microwave properties of these emerging materials at this stage can have a large impact on the development of future electronic systems. Such materials can provide novel device concepts useful to the commercial, military, and metrological communities.

Technical Strategy

The project's main thrusts in 2005 are to develop measurement methods to support the health care industries, measure materials at higher frequencies, broaden our measurement temperature range, and measure advanced materials over smaller dimensions. The current specific areas of research are thin films and printed wiring boards, applications to biotechnology, low-loss dielectric and magnetic crystals, probing methods for micro-nanoscale permittivity, dielectric metrology of advanced materials such as metamaterials, superconductors, and ferroelectrics, and theoretical modeling of dielectric relaxation.

In response to needs in the microelectronics industry, we are developing accurate methods for measuring the dielectric properties of thin films using both transmission-line and resonator methods. Using a previously developed on-wafer transmissionline model, we will extend measurements of thin films to frequencies above 40 gigahertz, and will also develop a new resonator method. We will also aid the PWB and LTCC industries in measuring the permittivity of substrates at high frequencies. To this end, we will further enhance our wideband, variable-temperature metrology. We will extend the capability of our Fabry-Perot measurement system to include variable temperatures, and will complete the model for the split-post resonator. We will measure a wide spectrum of ceramic materials commonly used in the electronics industry as a function of temperature. We will continue to work with and support IPC Tasks Groups and the LTCC Working Group through measurement assistance.

To satisfy documented needs in the health care, biotechnology, and metal-detector industries, we will characterize materials that emulate the electrical properties of the human body. We will also develop a coaxial probe for in-vitro measurements in support of research on detection of breast cancer. In addition, in support of the biotechnology industry, we will improve our liquid measurement metrology and will compare our measurements with NPL's using the liquid measurement methods we have developed.

To enhance the understanding of the physics of high-frequency losses in dielectrics we will test ferroelectric and other crystals over wide temperature and frequency ranges using an in-house model for determination of permittivity. We will also compare the measured losses as functions of temperature and frequency to expressions in the solid-state literature.

To support the microelectronics industry in on-chip dielectric measurement metrology, we will develop methods for evanescent microwave probing and atomic-force microscopy.

To support basic research on advanced composite materials technologies, we will develop measurement metrology on metamaterials.

We will support the development of standards by attending and contributing to standards committee meetings.

To accurately determine the microwave properties of developing materials, we will combine existing on-wafer measurement techniques with lithographically defined device structures to characterize advanced materials such as high-temperature superconductors, ferroelectric, and magnetoelectric thin films. We are also applying these techniques to perform on-chip characterization of small samples of biological materials or fluids using integrated microfluidic channels and reservoirs. Device measurements are then accomplished by utilizing a number of specialized microwave probe stations, such as our cryogenic probe station or 110 gigahertz probe station.

Accomplishments

Publications

Additional Information



Technical Contacts:
Jim Baker-Jarvis

Staff-Years (FY 2004):
6 professionals

Previous Reports:
2004

NIST
Electromagnetics Division

325 Broadway
Boulder, CO 80305-3328
Phone 303-497-3131
Fax 303-497-3122

May 20, 2005

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