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This project develops complementary metrology methods of nonlinear optical analysis, near-field optical spectroscopy, confocal microscopy, time-resolved photoluminescence, and X-ray diffraction analysis for studies of optical, electronic, and structural properties of compound semiconductor materials and structures. Its current focus is bulk and thin-film III nitrides, quantum nanowires, and nitride device structures. It also develops prototype nanowire devices.

Project Members:
Norman Sanford, Project Leader
Paul Blanchard
Todd Harvey
Aric Sanders
John Schlager

Ordinary refractive index of AlGaN measured by prism coupling correlated with spectroscopic reflection/transmission measurement.
Page updated: 10/06/2008
Welcome to the National Institute of Standard and Technology Optoelectronics Division.
Optical Materials Metrology Project - Project Information