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LASER POWER AND ENERGY METERS
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The Optoelectronics Division currently provides calibration services for meters used with the lasers, wavelengths, and power ranges shown in the following table. Other laser wavelengths, power, and energy levels are available upon request as Special Tests. Please contact Marla Dowell for additional information. |
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Description
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Wavelength
|
Range
|
Documentation |
Contact
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| Optical Fiber Power |
Absolute
Power Calibration
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670,
780, 850, 980, 1310, 1480, 1550, and 1625 nm
|
10
- 100 mW
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Igor Vayshenker | |
|
980
nm
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0.1
- 200 mW
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Optical
Fiber Power Meter Linearity
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850,
980, 1300, 1480, and 1550 nm
|
-90
to 0 dBm
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980
and 1480 nm
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0
to 30 dBm
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| Spectral Responsivity of Laser and Optical Fiber Power Meters | 400 - 1700 nm | 10 - 100 mW | SP250-53 | Josh Hadler | |
| CW | HeCd laser | 325 nm | 1 µW - 10 mW | SP250-75 | Josh Hadler |
| Argon laser | 351 and 364 nm |
1 µW - 1 W |
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| 488 nm | 1 µW - 6 W | ||||
| 514 nm | 1 µW - 10 W | ||||
| HeNe laser | 633 nm | 1 µW - 20 mW | |||
| Diode laser | 830 nm | 1 µW - 20 mW | |||
| Nd:YAG laser | 532 nm | 1 µW - 2 W | |||
| 1064 nm | 1 µW - 450 W (6 kW off-site) | ||||
| 1319 nm | 1 µW - 25 mW | ||||
| Erbium laser | 1550 nm | 1 µW - 100 mW | |||
| Ti:Sapphire laser | 700 - 950 nm | 1 nW - 1 W | |||
| CO2 laser | 10.6 µm |
1 W to 2 kW (6 kW off-site) |
Xiaoyu Li | ||
| Dye laser | Contact Josh Hadler for details. | ||||
| High Accuracy Laser Measurments | 375 to 1700 nm | 0.1 - 1 mW | SP250-62 | David Livigni | |
| Pulsed | Q-Switched Nd:YAG laser |
1.06 µm | 1
- 300 mJ/pulse energy 1 mW to 6 W average power 1 - 20 Hz laser repetition rate |
Xiaoyu Li | |
| Low
Level Nd:YAG laser |
1.06 µm | 10-4
- 10-8 W (peak power) 10-11 - 10-15 J/pulse energy 10 Hz to 300 kHz laser repetition rate |
SP250-64 | Rod Leonhardt | |
| KrF excimer laser | 248 nm |
5 µJ/Pulse
- 250 mJ/pulse energy |
ULSI 1998 | Chris Cromer | |
| ArF excimer laser | 193 nm |
5 µJ/Pulse
- 5 mJ/pulse energy |
ULSI 2000 | ||
| F2 excimer laser | 157 nm |
1 µJ/Pulse
- 1 mJ/Pulse eneryg |
Microlithography 2002 | ||